Nanoimprint and nanocontact technologies using hydrogen silsesquioxane

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 507-512

  Nakamatsu, Ken Ichiro ^a   Watanabe, Keiichiro ^a   Tone, Katsuhiko ^b   Namatsu, Hideo ^c   Matsui, Shinji ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b Meisyo Co   (Japan)

^c NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ELECTRODES; HYDROGEN INORGANIC COMPOUNDS; NANOSTRUCTURED MATERIALS; SUBSTRATES;

NANOCONTACT TECHNOLOGIES; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURE DEVICES;

NANOTECHNOLOGY;

EID: 31144460253     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1868695     Document Type: Conference Paper

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