Cl adsorption process on Si(1 1 1) surfaces

Surface Science

Volumn 493, Issue 1-3, 2001, Pages 143-147

  Sakurai, S ^a   Nakayama, T ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

Adsorption kinetics; Chemisorption; Chlorine; Density functional calculations; Etching; High index single crystal surfaces; Silicon; Solid gas interfaces

Indexed keywords

ADSORPTION; BINDING ENERGY; CHEMISORPTION; CHLORINE; ETCHING; SINGLE CRYSTALS; SURFACE STRUCTURE;

DENSITY FUNCTIONAL CALCULATIONS; HIGH INDEX SINGLE CRYSTALS;

SEMICONDUCTING SILICON;

EID: 0035500561     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01202-X     Document Type: Conference Paper

References (13)