Fabrication of a Cu nanodot array based on electroless plating employing a diblock copolymer nanotemplate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1137-1140

  Asakura, Shuichi ^a   Hozumi, Atsushi ^b   Fuwa, Akio ^a  

^a WASEDA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; CHEMISORPTION; COPPER; DECOMPOSITION; ELECTROLESS PLATING; FABRICATION; PLASTIC FILMS; POLYMETHYL METHACRYLATES; POLYSTYRENES; SPIN COATING; ULTRAVIOLET RADIATION;

NANODOTS; NANOTEMPLATE; VACUUM ULTRAVIOLET (VUV) LIGHT;

NANOSTRUCTURED MATERIALS;

EID: 31044447492     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1885023     Document Type: Conference Paper

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