-
1
-
-
0004099318
-
-
Wiley, New York
-
S.P. Murarka, I.V. Verner, R.J. Gutmann, Copper: Fundamental Mechanisms for Microelectronics Applications, Wiley, New York, 2000.
-
(2000)
Copper: Fundamental Mechanisms for Microelectronics Applications
-
-
Murarka, S.P.1
Verner, I.V.2
Gutmann, R.J.3
-
3
-
-
0041387388
-
-
Y. Zhang, S.S. Ang, A.A.O. Tay, D. Xu, E.T. Kang, K.G. Neoh, L.P. Chong, A.C.H. Huan, Langmuir 19 (2003) 6802-6806.
-
(2003)
Langmuir
, vol.19
, pp. 6802-6806
-
-
Zhang, Y.1
Ang, S.S.2
Tay, A.A.O.3
Xu, D.4
Kang, E.T.5
Neoh, K.G.6
Chong, L.P.7
Huan, A.C.H.8
-
4
-
-
0033709195
-
-
R. Rosenberg, D.C. Edelstein, C.-K. Hu, K.P. Rodbell, Annu. Rev. Mater. Sci. 30 (2000) 229-262.
-
(2000)
Annu. Rev. Mater. Sci.
, vol.30
, pp. 229-262
-
-
Rosenberg, R.1
Edelstein, D.C.2
Hu, C.-K.3
Rodbell, K.P.4
-
5
-
-
0028336573
-
-
W.J. Dressick, C.S. Dulcey, J.H. Georger, G.S. Calabrese, J.M. Calvert, J. Electrochem. Soc. 141 (1994) 210-220.
-
(1994)
J. Electrochem. Soc.
, vol.141
, pp. 210-220
-
-
Dressick, W.J.1
Dulcey, C.S.2
Georger, J.H.3
Calabrese, G.S.4
Calvert, J.M.5
-
8
-
-
0033896520
-
-
H. Esrom, R. Seeböck, M. Charbonnier, M. Romand, Surf. Coat. Technol. 125 (2000) 19-24.
-
(2000)
Surf. Coat. Technol.
, vol.125
, pp. 19-24
-
-
Esrom, H.1
Seeböck, R.2
Charbonnier, M.3
Romand, M.4
-
15
-
-
0031553367
-
-
M. Celina, H. Kudoh, T.J. Renk, K.T. Gillen, R.L. Clough, Radiat. Phys. Chem. 51 (1998) 191-194.
-
(1998)
Radiat. Phys. Chem.
, vol.51
, pp. 191-194
-
-
Celina, M.1
Kudoh, H.2
Renk, T.J.3
Gillen, K.T.4
Clough, R.L.5
-
16
-
-
0033326959
-
-
R. Heinz, E. Klusmann, H. Meyer, R. Schulz, Surf. Coat. Technol. 116/119 (1999) 886-890.
-
(1999)
Surf. Coat. Technol.
, vol.116-119
, pp. 886-890
-
-
Heinz, R.1
Klusmann, E.2
Meyer, H.3
Schulz, R.4
-
18
-
-
0347480557
-
-
Z. Wang, J. Zhanng, R. Xing, J. Yuan, D. Yan, Y. Hau, J. Am. Chem. Soc. 125 (2003) 15278-15279.
-
(2003)
J. Am. Chem. Soc.
, vol.125
, pp. 15278-15279
-
-
Wang, Z.1
Zhanng, J.2
Xing, R.3
Yuan, J.4
Yan, D.5
Hau, Y.6
-
19
-
-
0035798016
-
-
J. Hyun, Y. Zhu, A. Liebmann-Vinson, T. Beebe Jr., A. Chilkoti, Langmuir 17 (2001) 6358-6367.
-
(2001)
Langmuir
, vol.17
, pp. 6358-6367
-
-
Hyun, J.1
Zhu, Y.2
Liebmann-Vinson, A.3
Beebe Jr., T.4
Chilkoti, A.5
-
20
-
-
0347568198
-
-
A. Khademhosseini, S. Jon, K.Y. Suh, T.N.T. Tran, G. Eng, I. Yeh, J. Seong, R. Langer, Adv. Mater. 15 (2003) 1995-2000.
-
(2003)
Adv. Mater.
, vol.15
, pp. 1995-2000
-
-
Khademhosseini, A.1
Jon, S.2
Suh, K.Y.3
Tran, T.N.T.4
Eng, G.5
Yeh, I.6
Seong, J.7
Langer, R.8
-
21
-
-
0037014680
-
-
Y.-L. Loo, R.L. Willett, K.W. Baldwin, J.A. Rogers, J. Am. Chem. Soc. 124 (2002) 7654-7655.
-
(2002)
J. Am. Chem. Soc.
, vol.124
, pp. 7654-7655
-
-
Loo, Y.-L.1
Willett, R.L.2
Baldwin, K.W.3
Rogers, J.A.4
-
22
-
-
0034248008
-
-
H. Kind, M. Geissler, H. Schmid, B. Michel, K. Kern, E. Delamarche, Langmuir 16 (2000) 6367-6373.
-
(2000)
Langmuir
, vol.16
, pp. 6367-6373
-
-
Kind, H.1
Geissler, M.2
Schmid, H.3
Michel, B.4
Kern, K.5
Delamarche, E.6
-
23
-
-
79955982756
-
-
D.B. Wolfe, J.C. Love, K.E. Paul, M.L. Chabinyc, G.M. Whitesides, Appl. Phys. Lett. 80 (2002) 2222-2224.
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2222-2224
-
-
Wolfe, D.B.1
Love, J.C.2
Paul, K.E.3
Chabinyc, M.L.4
Whitesides, G.M.5
-
24
-
-
0000730481
-
-
P.C. Hidber, W. Helbig, E. Kim, G.W. Whitesides, Langmuir 12 (1996) 1375-1380.
-
(1996)
Langmuir
, vol.12
, pp. 1375-1380
-
-
Hidber, P.C.1
Helbig, W.2
Kim, E.3
Whitesides, G.W.4
-
25
-
-
0000860135
-
-
P.C. Hidber, P.F. Nealey, W. Helhig, G.M. Whitesides, Langmuir 12 (1996) 5209-5215.
-
(1996)
Langmuir
, vol.12
, pp. 5209-5215
-
-
Hidber, P.C.1
Nealey, P.F.2
Helhig, W.3
Whitesides, G.M.4
-
26
-
-
85024811287
-
-
A. Hozumi, Y. Yokogawa, T. Kameyama, H. Sugimura, K. Hayashi, H. Shirahata, O. Takai, J. Vac. Sci. Technol. A 19 (2001) 1812-1816.
-
(2001)
J. Vac. Sci. Technol. A
, vol.19
, pp. 1812-1816
-
-
Hozumi, A.1
Yokogawa, Y.2
Kameyama, T.3
Sugimura, H.4
Hayashi, K.5
Shirahata, H.6
Takai, O.7
-
29
-
-
0037683114
-
-
A. Spiegel, W.H. Bruenger, C. Dzionk, P. Schmuki, Microelectron. Eng. 67-68 (2003) 175-181.
-
(2003)
Microelectron. Eng.
, vol.67-68
, pp. 175-181
-
-
Spiegel, A.1
Bruenger, W.H.2
Dzionk, C.3
Schmuki, P.4
-
31
-
-
0038276992
-
-
L. Xu, J. Liao, L. Huang, D. Ou, Z. Gro, H. Zhang, C. Ge, N. Gu, J. Lin, Thin Solid Films 434 (2003) 121-125.
-
(2003)
Thin Solid Films
, vol.434
, pp. 121-125
-
-
Xu, L.1
Liao, J.2
Huang, L.3
Ou, D.4
Gro, Z.5
Zhang, H.6
Ge, C.7
Gu, N.8
Lin, J.9
-
33
-
-
0035281728
-
-
H.-D. Lin, Y.-P. Zhao, G. Ramanath, S.P. Murarka, G.C. Wang, Thin Solid Films 384 (2001) 151-156.
-
(2001)
Thin Solid Films
, vol.384
, pp. 151-156
-
-
Lin, H.-D.1
Zhao, Y.-P.2
Ramanath, G.3
Murarka, S.P.4
Wang, G.C.5
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