Development and structuring of combined positive-negative/negative-positive resists using laser ablation as positive dry etching technique

Macromolecular Materials and Engineering

Volumn 283, Issue , 2000, Pages 140-143

  Gassan, Jochen ^a   Gutowski, Voytek S ^b   Bledzki, Andrzej K ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CINNAMALDEHYDE DERIVATIVE; POLYMER;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; CROSS LINKING; EXCIMER LASER; MATERIALS; MATERIALS TESTING; PHOTOCHEMISTRY;

EID: 0034348026     PISSN: 14387492     EISSN: None     Source Type: Journal    
DOI: 10.1002/1439-2054(20001101)283:1<140::AID-MAME140>3.0.CO;2-F     Document Type: Article

References (16)