The hydrophilization of polystyrene substrates by 172-nm vacuum ultraviolet light

Journal of Colloid and Interface Science

Volumn 278, Issue 2, 2004, Pages 383-392

  Hozumi, Atsushi ^a   Inagaki, Hironobu ^b   Kameyama, Tetsuya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b CHUBU UNIVERSITY   (Japan)

Author keywords

172 nm vacuum ultraviolet light; Angle resolved XPS; Hydrophilization; Hydrophobic recovery; Photoetching; Polystyrene

Indexed keywords

HYDROPHILIZATION; PHOTOCHEMICAL SURFACE MODIFICATION; PHOTOETCHING RATE; POLYSTYRENE SUBSTRATES (PS);

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ETCHING; HYDROPHILICITY; MICROSTRUCTURE; PHOTOCHEMICAL FORMING; PHOTOOXIDATION; ULTRAVIOLET RADIATION; VACUUM; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYSTYRENES;

OXYGEN; POLYSTYRENE DERIVATIVE; WATER;

AIR; ARTICLE; ATMOSPHERE; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; CHEMICAL STRUCTURE; CONTACT ANGLE; EXPOSURE; HYDROPHILICITY; HYDROPHOBICITY; IMAGE ANALYSIS; MOLECULE; MORPHOLOGY; PHOTOCHEMISTRY; PHOTOOXIDATION; PRESSURE; PRIORITY JOURNAL; SAMPLE; STRUCTURE ANALYSIS; SURFACE PROPERTY; TECHNIQUE; ULTRAVIOLET IRRADIATION; ULTRAVIOLET RADIATION; VACUUM; WETTABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 4344701553     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2004.06.005     Document Type: Article

References (54)

1. Gerenser L.J. J. Adhes. Sci. Technol. 1:1987;303
2. Idage S.B., Badrinarayanan S. Langmuir. 14:1998;2780
3. France R.M., Short R.D. Langmuir. 14:1998;4827
4. Dupont-Gillain Ch.C., Adriaensen Y., Derclaye S., Rouxhet P.G. Langmuir. 16:2000;8194
5. Schulz U., Munzert P., Kaiser N. Surf. Coat. Technol. 142-144:2001;507
6. Pascu M., Vasile C., Gheorghiu M. Mater. Chem. Phys. 80:2003;548
7. Zhang D., Dougal S.M., Yeganeh M.S. Langmuir. 16:2000;4528
8. Onyiriuka E.C., Hersh L.S., Hertl W. J. Colloid Interface Sci. 144:1991;98
9. Higashiyama Y., Yanase S., Sugimoto T. J. Electrostat. 55:2002;351
10. Gassan J., Gutowski V.S. Compos. Sci. Technol. 60:2000;2857
11. Friedrich J., Wigant L., Unger W., Lippitz A., Wittrich H. Surf. Coat. Technol. 98:1998;879
12. Teare D.O.H., Emmison N., Ton-That C., Bradley R.H. Langmuir. 16:2000;2818
13. Dong H., Bell T. Surf. Coat. Technol. 111:1999;29
14. Netcheva S., Bertrand P. Nucl. Instrum. Methods Phys. Res. B. 151:1999;129
15. Iwaki M. Nucl. Instrum. Methods Phys. Res. B. 175-177:2001;368
16. Onyiriuka E.C., Hersh L.S., Hertl W. Appl. Spectrosc. 44:1990;808
17. Onyiriuka E.C. J. Appl. Polym. Sci. 47:1993;2187
18. Marmey P., Porté M.C., Baquey Ch. Nucl. Instrum. Methods Phys. Res. B. 208:2003;429
19. Astumian R.D., Schelly Z.A. J. Am. Chem. Soc. 106:1984;304
20. Fadeev A.Y., McCarthy T.J. Langmuir. 14:1998;5586
21. Chen W., McCarthy T.J. Macromolecules. 31:1998;3648
22. Lim H., Lee Y., Han S., Cho J., Kim K.-J. J. Vac. Sci. Technol. A. 19:2001;1490
23. Yasuda H. Plasma Polymerization. 1985;Academic Press, London. p. 345
24. Briggs D., Seah M.P. Practical Surface Analysis. 1983;Wiley, Chichester. p. 359
25. Ponomarev A.N., Maksimov A.I., Vasilets V.N., Menagarishvily V.M. High Energy Chem. 23:1989;231
26. Vasilets V.N., Kovalchuk A.V., Ponomarev A.N. J. Polym. Sci. Technol. 7:1994;165
27. Liston E.M. J. Adhesion. 30:1989;199
28. Holländer A., Klemberg-Sapieha J.E., Wertheimer M.R. J. Polym. Sci. Part A Polym. Chem. 33:1995;2013
29. Esrom H., Kogelschatz U. Thin Solid Films. 218:1992;231
30. Bergonzo P., Boyd I.W. J. Appl. Phys. 76:1994;4372
31. Zhang J.-Y., Esrom H., Kogelschatz U., Emig G. J. Adhes. Sci. Technol. 8:1994;1179
32. Fuchs C., Goetzberger O., Henck R., Fogarassy E. Appl. Phys. A. 60:1995;505
33. Heittz J., Niino H., Yabe A. Jpn. J. Appl. Phys. 35:1996;4110
34. Heittz J., Niino H., Yabe A. Appl. Phys. Lett. 68:1996;2648
35. Zhang Q., Gomi M., Itoh T., Abe M. Jpn. J. Appl. Phys. 35:1996;665
36. Bader H., Gessler M., Rodler N. Kunststoffe. 87:1997;636
37. Hozumi A., Masuda T., Hayashi K., Sugimura H., Takai O., Kameyama T. Langmuir. 18:2002;9022
38. Kudo K., Iwabuchi T., Mutoh K., Miyata T., Sano R., Tanaka K. Jpn. J. Appl. Phys. 29:1990;2572
39. Matienzo L.J., Zimmerman J.A., Egitto F.D. J. Vac. Sci. Technol. A. 12:1994;2662
40. Holländer A., Klemberg-Sapieha J.E., Wertheimer M.R. Macromolecules. 27:1994;2893
41. Klemberg-Sapieha J.E., Wertheimer M.R., Holländer A. Surf. Coat. Technol. 74-75:1995;55
42. Holländer A., Klemberg-Sapieha J.E., Wertheimer M.R. J. Polym. Sci. Part A Polym. Chem. 34:1996;1511
43. Fozza A.C., Roch J., Klemberg-Sapieha J.E., Kruse A., Holländer A., Wertheimer M.R. Nucl. Instrum. Methods Phys. Res. B. 131:1997;205
44. Holländer A., Behnisch J. Surf. Coat. Technol. 98:1998;855
45. Holländer A., Wilken R., Behnisch J. Surf. Coat. Technol. 116-119:1999;788
46. Okudaira K.K., Morikawa E., Hasegawa S., Sprunger P.T., Saile V., Seki K., Harada Y., Ueno N. J. Electron Spectrosc. Relat. Phenom. 89-91:1998;913
47. Costela A., Garcia-Moreno I., Florido F., Figuera J.M., Sastre R., Hooker S.M., Cashmore J.S., Webb C.E. J. Appl. Phys. 77:1995;2343
48. Kokai F., Saito H., Fujioka T. J. App. Phys. 66:1989;3252
49. Beamson G., Briggs D. High Resolution XPS of Organic Polymers. 1992;Wiley, New York
50. Kaspar T., Tuan A., Tonkyn R., Hess W.P., Rogers J.W. Jr., Ono Y. J. Vac. Sci. Technol. B. 21:2003;895
51. Clouet F., Shi M.K. J. Appl. Polym. Sci. 46:1992;1955
52. Moss S.J., Jolly A.M., Tighe B.J. Plasma Chem. Plasma Proc. 6:1986;401
53. Yasuda T., Okuno T., Yoshida K. J. Polym. Sci. B. 26:1988;1781
54. Murakami T., Kuroda S., Ozawa Z. J. Colloid Interface Sci. 202:1998;37