Spatially defined surface modification of poly(methyl methacrylate) using 172 nm vacuum ultraviolet light

Langmuir

Volumn 18, Issue 23, 2002, Pages 9022-9027

  Hozumi, Atsushi ^a   Masuda, Tomoko ^b   Hayashi, Kazuyuki ^c   Sugimura, Hiroyuki ^c   Takai, Osamu ^c   Kameyama, Tetsuya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b CHUBU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

VACUUM ULTRAVIOLET (VUV) LIGHT;

ATMOSPHERIC PRESSURE; CHEMICAL BONDS; CONTACT ANGLE; EXCIMER LASERS; FABRICATION; HYDROPHILICITY; HYDROPHOBICITY; MASKS; MICROSTRUCTURE; PHOTOOXIDATION; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

POLYMETHYL METHACRYLATES;

EID: 0037069528     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la020478b     Document Type: Article

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