Molecular design and development of photoresists for ArF excimer laser lithography

Polymers for Advanced Technologies

Volumn 11, Issue 8-12, 2000, Pages 560-569

  Hasegawa, Etsuo ^a   Maeda, Katsumi ^a   Iwasa, Shigeyuki ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLATION; DYNAMIC RANDOM ACCESS STORAGE; EPOXY RESINS; EXCIMER LASERS; LASER BEAMS; MONOMERS; PHOTORESISTS;

HYDROPHILIC ALICYCLIC POLYMERS;

POLYACRYLATES;

EID: 0034242107     PISSN: 10427147     EISSN: None     Source Type: Journal    
DOI: 10.1002/1099-1581(200008/12)11:8/12<560::AID-PAT6>3.0.CO;2-O     Document Type: Article

References (20)