High aspect ratio, 3D structuring of photoresist materials by ion beam LIGA

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 96-103

  Munnik, F ^a   Benninger, F ^a   Mikhailov, S ^a   Bertsch, A ^b   Renaud, P ^b   Lorenz, H ^c   Gmur M ^d  

^a Ecole d'Ingenieurs de l'Arc Jurassien   (Switzerland)

^b EPFL   (Switzerland)

^c Mimotec SA   (Switzerland)

^d WEIDMANN Electrical Technology Inc   (Switzerland)

Author keywords

Deep ion beam lithography; Micromachining; Microstructures

Indexed keywords

ASPECT RATIO; ION BEAM LITHOGRAPHY; IRRADIATION; MICROMACHINING;

ION-BEAM FOCUSSING SYSTEMS;

PHOTORESISTORS;

EID: 4944249543     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00064-9     Document Type: Conference Paper

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