High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages

  Aktary, Mirwais ^a   Jensen, Martin O ^a   Westra, Kenneth L ^a   Brett, Michael J ^a   Freeman, Mark R ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; DIFFRACTION GRATINGS; DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ELLIPSOMETRY; EPOXY RESINS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY;

PATTERN TRANSFER;

PHOTORESISTS;

EID: 0141569940     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1596216     Document Type: Conference Paper

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