Characterization of polycrystalline AlN films using variable-angle spectroscopic ellipsometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1284-1289

  Wang, Li Peng ^a   Shim, Dong S ^a   Ma, Qing ^a   Rao, Valluri R ^a   Ginsburg, Eyal ^b   Talalyevsky, Alexander ^b  

^a INTEL CORPORATION   (United States)

^b INTEL CORPORATION   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDRICAL SYMMETRY; MICROGRAPHS; OPTICAL CONSTANTS;

ALUMINUM NITRIDE; ELLIPSOMETRY; MICROSTRUCTURE; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

POLYCRYSTALLINE MATERIALS;

EID: 31044440397     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1875192     Document Type: Conference Paper

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