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Volumn 55, Issue 2, 2001, Pages 214-220

Rough wetting

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Indexed keywords


EID: 0035796136     PISSN: 02955075     EISSN: None     Source Type: Journal    
DOI: 10.1209/epl/i2001-00402-x     Document Type: Article
Times cited : (671)

References (15)
  • 1
    • 85021792427 scopus 로고
    • WENZEL R. N., Ind. Eng. Chem., 28 (1936) 988; J. Phys. Colloid Chem., 53 (1949) 1466.
    • (1936) Ind. Eng. Chem. , vol.28 , pp. 988
    • Wenzel, R.N.1
  • 2
    • 0012397491 scopus 로고
    • WENZEL R. N., Ind. Eng. Chem., 28 (1936) 988; J. Phys. Colloid Chem., 53 (1949) 1466.
    • (1949) J. Phys. Colloid Chem. , vol.53 , pp. 1466
  • 11
    • 0038476893 scopus 로고    scopus 로고
    • Let us stress that for these "two-levels" surfaces, r and φs can be treated as independent: for example, increasing the height of the spike keeping everything else constant makes r increase at a constant φs. This opens the possibility for a fine tuning of the wetting properties of a solid. First realizations of such surfaces are described in ÖNER D. and MCCARTHY T. J., Langmuir, 16 (2000) 7777.
    • (2000) Langmuir , vol.16 , pp. 7777
    • Öner, D.1    McCarthy, T.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.