Laser-induced photodetachment in high-density low-pressure SF6 magnetoplasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2363-2371

  St Onge, L ^a,c   Chaker, M ^b   Margot, J ^a  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b INRS EMT   (Canada)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE PROPAGATION; IONIZATION; LASER BEAM EFFECTS; NEGATIVE IONS; PLASMA PROBES; POSITIVE IONS; PRESSURE EFFECTS;

LASER INDUCED PHOTODETACHMENT (LIPD);

MAGNETOPLASMA;

EID: 0034276293     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1285935     Document Type: Article

References (34)

1. O. A. Popov, High Density Plasma Sources: Design, Physics, Performances (Noyes, Park Ridge, 1995).
2. J. Margot and M. Moisan, in Plasma Processing of Semi-Conductors, NATO-ASI Series E: Applied Physics, Vol. 336, edited by P. F. Williams (Kluwer, Dordrecht, 1997), pp. 187-210.
3. F. Bounasri, E. Gat, M. Chaker, M. Moisan, J. Margot, and M. F. Ravet, J. Appl. Phys. 78, 6780 (1995).
4. E. Gat, F. Bounasri, M. Chaker, M. F. Ravet, M. Moisan, and J. Margot, Microelectron. Eng. 30, 337 (1996).
5. J. Margot, M. Chaker, M. Moisan, L. St-Onge, F. Bounasri, A. Dallaire, and E. Gat, in Plasma Processing of Semi-Conductors, NATO-ASI Series E: Applied Physics, Vol. 336, edited by P. F. Williams (Kluwer, Dordrecht, 1997), pp. 491-513.
6. L. St-Onge, J. Margot, and M. Chaker, Plasma Sources Sci. Technol. 7, 154 (1998).
7. Y. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1991), Chap. 4.
8. E. Stoffels, W. W. Stoffels, D. Vender, M. Haverlag, G. M. W. Kroesen, and F. J. de Hoog, Contrib. Plasma Phys. 35, 331 (1995).
9. J. L. Jauberteau, G. J. Meeusen, M. Haverlag, G. M. W. Kroesen, and F. J. de Hoog, Appl. Phys. Lett. 55, 2597 (1989).
10. K. E. Greenberg, G. A. Hebner, and J. T. Verdeyen, Appl. Phys. Lett. 44, 299 (1984).
11. A. Kono, M. Endo, K. Ohata, S. Kishimoto, and T. Goto, J. Appl. Phys. 76, 7221 (1994).
12. N. Takada, D. Hayashi, K. Sasaki, and K. Kadota, Jpn. J. Appl. Phys., Part 2 36, L1702 (1997).
13. B. Petit and J. Pelletier, Jpn. J. Appl. Phys., Part 1 26, 825 (1987);
14. B. Petit, Ph.D. thesis, Université Scientifique et Médicale de Grenoble, 1985.
15. J. Margot, M. Chaker, L. St-Onge, M. Tabbal, A. Aliouchouche, O. Pauna, C. Alinot, and C. Kliagine, J. Phys. IV 7, C4 (1997).
16. L. St-Onge, J. Margot, and M. Chaker, Appl. Phys. Lett. 72, 290 (1998).
17. M. Bacal, G. W. Hamilton, A. M. Bruneteau, H. J. Doucet, and J. Taillet, Rev. Sci. Instrum. 50, 719 (1979).
18. F. El Balghiti-Sube, F. G. Baksht, and M. Bacal, Rev. Sci. Instrum. 67, 2221 (1996).
19. E. C. M. Chen, L.-R. Shuie, E. D. D'Sa, C. F. Batten, and W. E. Wentworth, J. Chem. Phys. 88, 4711 (1988).
20. C. Blondel, P. Cacciani, C. Delsart, and R. Trainham, Phys. Rev. A 40, 3698 (1989).
21. H. Hotop and W. C. Lineberger, J. Phys. Chem. Ref. Data 14, 731 (1985).
22. A. E. S. Miller, T. M. Miller, A. A. Viggiano, R. A. Morris, J. M. V. Doren, S. T. Arnold, and J. F. Paulson, J. Chem. Phys. 102, 8865 (1995).
23. R. A. King, J. M. Galbraith, and H. F. Schaefer III, J. Phys. Chem. 100, 6061 (1996).
24. K. Nagaseki, I. Ishikawa, E. Nishimura, Y. Saito, and S. Suganomata, Jpn. J. Appl. Phys., Part 2 34, L852 (1995).
25. S. Sasaki, I. Ishikawa, K. Nagaseki, Y. Saito, and S. Suganomata, Jpn. J. Appl. Phys., Part 1 36, 847 (1997).
26. F. Bounasri, M. Moisan, L. St-Onge, J. Margot, M. Chaker, J. Pelletier, M. A. El Khakani, and E. Gat, J. Appl. Phys. 77, 4030 (1995).
27. M. J. Kushner, J. Appl. Phys. 53, 2939 (1982).
28. S. Vacquié, A. Gleizes, and M. Sabsabi, Phys. Rev. A 35, 1615 (1987).
29. Y. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1991), Chap. 9.
30. I. Pérès and L. C. Pitchford, J. Appl. Phys. 78, 774 (1995).
31. L. St-Onge, Ph.D. thesis, Université de Montréal, 1996.
32. M. B. Hopkins, M. Bacal, and W. G. Graham, J. Appl. Phys. 70, 2009 (1991).
33. T. H. Ahn, K. Nakamura, and H. Sugai, Jpn. J. Appl. Phys., Part 2 34, L1405 (1995).
34. T. Mieno and S. Samukawa, Plasma Sources Sci. Technol. 6, 398 (1997).