Investigations of rate coefficients in the Cl model

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 58-59

  Helmsen, John ^a   Hammer, David ^b   Yamartino, John ^a   Loewenhardt, Peter ^a  

^a APPLIED MATERIALS INC   (United States)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHLORINE; COMPUTER SIMULATION; DISSOCIATION; PLASMA ETCHING;

DECOUPLED PLASMA SOURCES; HYBRID PLASMA EQUIPMENT MODEL;

PLASMA SOURCES;

EID: 0032679014     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763034     Document Type: Article

References (3)

1. P. Loewenhardt, "Plasma diagnostics: Use and justification in an industrial environment," presented at the 51st Annu. Gaseous Electron. Conf., Maui, Hawaii, Oct. 1998.
2. P. L. G. Ventzek, M. Grapperhaus, and M. J. Kushner, "Investigation of electron source and ion flux uniformity in high plasma density inductively plasma tools using 2-dimensional modeling," J. Vac. Sci. Tech. B, vol. 12, pp. 3118-3137, 1994.
3. G. A. Bird, Molecular Gas Dynamics and the Direct Simulation of Gas Flows. Oxford, U.K.: Claredon, 1994.