Single-source MOCVD of Y-, Ba- and Cu-oxides from thd-precursors

Journal of Alloys and Compounds

Volumn 251, Issue 1-2, 1997, Pages 249-253

  Klippe, L ^a   Wahl, G ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Deposition kinetics; MOCVD; Thin films

Indexed keywords

BARIUM COMPOUNDS; COPPER OXIDES; PYROLYSIS; REACTION KINETICS; THIN FILMS; YTTRIUM COMPOUNDS;

DECOMPOSITION TEMPERATURE;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0031120996     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(96)02681-3     Document Type: Article

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