Solid single-source metal organic chemical vapor deposition of yttriastabilized zirconia

Thin Solid Films

Volumn 339, Issue 1-2, 1999, Pages 165-173

  Dubourdieu, C ^a,b   Kang, S B ^a   Li, Y Q ^a,c   Kulesha, G ^a   Gallois, B ^a  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b Grenoble INP Phelma   (France)

^c NZ Applied Technologies   (United States)

Author keywords

Chemical vapour deposition; Oxides; Structural properties; Zirconium

Indexed keywords

ALUMINA; COMPOSITION EFFECTS; GROWTH (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MIXTURES; SILICON; YTTRIUM COMPOUNDS;

SOLID SINGLE-SOURCE METALLORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD);

SUPERCONDUCTING FILMS;

EID: 0033534982     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01330-3     Document Type: Article

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