Surface induced bulk modifications of amorphous carbon nitride films by post-deposition oxygen and hydrogen plasma treatment

Thin Solid Films

Volumn 491, Issue 1-2, 2005, Pages 161-167

  Miyajima, Y ^a   Nitta, S ^a   Silva, S R P ^a   Zeze, D A ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b DURHAM UNIVERSITY   (United Kingdom)

Author keywords

Amorphous carbon nitride; Optical properties; Sputtering; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS MATERIALS; ARGON; CARBON NITRIDE; COMPOSITION; HYDROGEN; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; REFRACTIVE INDEX; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE; PLASMA TREATMENT; RADIO FREQUENCY; TAUC BAND GAPS;

THIN FILMS;

EID: 25144490821     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.033     Document Type: Article

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