The effects of oxygen plasma radiation on a-C:H films

Vacuum

Volumn 68, Issue 2, 2002, Pages 203-209

  Sang, H Y ^a,b   Zhang, W J ^b   Wang, T M ^b  

^a INSTITUTE OF PHYSICS   (China)

^b BEIHANG UNIVERSITY   (China)

Author keywords

a C:H oxygen plasma effect

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY;

PLASMA RADIATION;

AMORPHOUS FILMS;

EID: 0037206614     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00508-0     Document Type: Article

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