Carbon nitride films deposited by very high-fluence XeCl excimer-laser reactive ablation

Applied Surface Science

Volumn 154, Issue , 2000, Pages 369-375

  Acquaviva, S ^a   D'Anna, E ^a   De Giorgi, M L ^a   Fernandez M ^a   Leggieri, G ^a   Luches, A ^a   Zocco, A ^a   Majni, G ^b  

^a Dipto Fis Ist Naz Fis Della M   (Italy)

^b UNIVERSITÀ POLITECNICA DELLE MARCHE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; EXCIMER LASERS; GRAPHITE; LASER ABLATION; NITROGEN; SILICON; SINGLE CRYSTALS; THIN FILMS;

CARBON NITRIDE FILMS;

NITRIDES;

EID: 0033885620     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00376-1     Document Type: Article

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