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Volumn 41, Issue 7 A, 2002, Pages 4651-4654
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Effects of oxygen and substrate temperature on properties of amorphous carbon films fabricated by plasma-assisted pulsed laser deposition method
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Author keywords
Amorphous carbon (a C); Diamond; Graphite; Oxygen plasma; Pulsed laser deposition (PLD); Raman spectroscopy; SEM; Substrate temperature; XPS
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CARBON;
COMPOSITION EFFECTS;
MORPHOLOGY;
OXYGEN;
PLASMA APPLICATIONS;
PULSED LASER DEPOSITION;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SURFACE ROUGHNESS;
THERMAL EFFECTS;
X RAY PHOTOELECTRON SPECTROSCOPY;
AMORPHOUS CARBON FILMS;
OXYGEN PLASMA;
PLASMA ASSISTED PULSED LASER DEPOSITION;
AMORPHOUS FILMS;
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EID: 0036656109
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.4651 Document Type: Article |
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Times cited : (26)
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References (15)
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