Erbium-doped thin amorphous carbon films prepared by mixed CVD sputtering

Applied Surface Science

Volumn 238, Issue 1-4 SPEC. ISS., 2004, Pages 117-120

  Speranza, G ^a   Calliari, L ^a   Ferrari, M ^b   Chiasera, A ^c   Tran Ngoc, K ^b,c   Baranov, A M ^d   Sleptsov, V V ^d   Nefedov, A A ^d   Varfolomeev, A E ^e   Fanchenko, S S ^e  

^a ITC IRST   (Italy)

^b IFN CNR   (Italy)

^c UNIVERSITY OF TRENTO   (Italy)

^d MOSCOW AVIATION INSTITUTE NATIONAL RESEARCH UNIVERSITY   (Russian Federation)

^e KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

Carbon films; CVD; Luminescence; Magnetron sputtering; XPS

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC POTENTIAL; ERBIUM; GRAPHITE; HYDROGEN; HYDROGENATION; LIGHT ABSORPTION; LUMINESCENCE; MAGNETRON SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON FILMS; DEPOSITION PARAMETERS; ENERGY RESOLUTION; TRANSMISSION MODES;

CARBON FIBERS;

EID: 4644226095     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.191     Document Type: Conference Paper

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