Preparation and properties of reactive-sputtered amorphous CN x films

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 274-277

  Takada, Naoyuki ^a   Arai, Kenta ^a   Nitta, Shoji ^a   Nonomura, Shuichi ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

A CN X; Dc conductivity; Hydrogen plasma treatment; Infrared absorption spectra; Nitrogen carbon ratio; Optical gap

Indexed keywords

AMORPHOUS FILMS; ARGON; CARBON; ELECTRIC CONDUCTIVITY; ELECTRON SPIN RESONANCE SPECTROSCOPY; HYDROGEN; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; NITROGEN; PHOTOCONDUCTIVITY; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; HYDROGEN PLASMA TREATMENT; INFRARED ABSORPTION SPECTRA; OPTICAL GAP; ULTRA VIOLET TRANSMITTANCE SPECTROSCOPY;

THIN FILMS;

EID: 0039098526     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00772-6     Document Type: Article

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