Targeting mass-selected cluster ions for the deposition of advanced carbonaceous materials using an inductively coupled plasma

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1819-1827

  Zeze, D A ^a   Silva, S R P ^a   Brown, N M D ^b   Joyce, A M ^b   Anderson, C A ^b  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ADAMANTANES; ATOMIC CONCENTRATION; CARBONACEOUS MATERIALS; CLUSTER IONS; DEPOSITED FILMS; DIFFERENT SIZES; DRIVING POWER; ELECTRICAL CHARACTERISTIC; FRAGMENTATION BEHAVIOR; HIGH SURFACE ENERGY; LOW SURFACE ENERGY; MASS-SELECTED CLUSTERS; ON/OFF RATIO; OPTICAL DATA; POST-DEPOSITION; PULSE SEQUENCE; PULSED SOURCE; RELATIVE ABUNDANCE; RF-POWER; SELECTION TECHNIQUES; XPS DATA;

ARGON; CONTACT ANGLE; DEPOSITION; ELECTRIC POWER SYSTEMS; INDUCTIVELY COUPLED PLASMA; IONS; PHOTOELECTRONS; REFRACTIVE INDEX; THIN FILMS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

VAPOR DEPOSITION;

EID: 33845412632     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1435417     Document Type: Article

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