Etching behaviour of pure and metal containing amorphous carbon films prepared using filtered cathodic vacuum arc technique

Applied Surface Science

Volumn 195, Issue 1-4, 2002, Pages 107-116

  Yu, L J ^a   Sheeja, D ^a   Tay, B K ^a   Chua, Daniel H C ^b   Milne, W I ^b   Miao, J ^c   Fu, Y Q ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Filtered cathodic vacuum arc deposition; Metal containing carbon films; Reactive ion beam etching; Reactive ion etching; Tetrahedral amorphous carbon film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CATHODES; DEPOSITION; ETCHING; MORPHOLOGY; PLASMAS; SURFACE ROUGHNESS; TITANIUM;

REACTIVE ION BEAM ETCHING (RIBE);

AMORPHOUS FILMS;

EID: 0037099252     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00552-4     Document Type: Article

References (17)

1. LNBM nishioka
2. Microstructure and mechanical properties of nanocomposite amorphous carbon films