Preparation and properties of photoconductive amorphous carbon nitride a-CNx films: The layer-by-layer method

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 655-658

  Nitta, S ^a   Takada, N ^a,b   Sugiyama, K ^a   Itoh, T ^a   Nonomura, S ^a  

^a GIFU UNIVERSITY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

Author keywords

a CNx; Dc and photoconductivity; ESR; Hydrogen plasma treatment; Infrared absorption spectra; Layer by layer; Optical properties; Photoluminescence; Reactive sputtering

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRONIC PROPERTIES; HYDROGENATION; INFRARED SPECTROSCOPY; OPTICAL PROPERTIES; PHOTOCONDUCTING MATERIALS; PHOTOCONDUCTIVITY; PHOTOLUMINESCENCE; PLASMA APPLICATIONS;

AMORPHOUS CARBON NITRIDE FILMS; HYDROGEN PLASMA TREATMENT; LAYER BY LAYER METHOD;

AMORPHOUS FILMS;

EID: 0032066994     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00191-4     Document Type: Article

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