Evaluation of pattern fidelity in EUVL using a high-numerical-aperture small-field EUV exposure tool (HiNA)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 733-740

  Tanaka, Yuusuke ^a   Oizumi, Hiroaki ^a   Hashimoto, Takeo ^a   Kumasaka, Fumiaki ^a   Nishiyama, Iwao ^a   Abe, Tsukasa ^b   Mohri, Hiroshi ^b   Hayashi, Naoya ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Contrast; EUVL; Fidelity; Flare; HiNA; Mask; OPC; Projection optics; Resist; Wavefront error

Indexed keywords

ERROR ANALYSIS; IMAGE QUALITY; MASKS; PATTERN RECOGNITION; ULTRAVIOLET RADIATION; WAVEFRONTS;

CONTRAST; EXTREME-ULTRAVIOLET LITHOGRAPHY (EUVL); FIDELITY; FLARE; HINA; MASK FABRICATION; OPTICAL PROXIMITY CORRECTION (OPC); PROJECTION OPTICS; RESIST; WAVEFRONT ERROR;

LITHOGRAPHY;

EID: 24644442635     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599050     Document Type: Conference Paper

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