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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 897-905

Fabrication of aspherical mirrors for HiNA (High Numerical Aperture EUV exposure tool) set-3 projection optics

(13) Oshino, T a Yamamoto, T a Miyoshi, T a Shiraishi, M a Komiya, T a Kandaka, N a Kondo, H a Mashima, K a Nomura, K a Murakami, K a Oizumi, H b Nishiyama, I b Okazaki, S b

a NIKON CORPORATION (Japan)

b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET (Japan)

Author keywords

Flare; High spatial frequency roughness; Low spatial frequency roughness; Mid spatial frequency roughness; Wavefront error

Indexed keywords

ATOMIC FORCE MICROSCOPY; ERROR ANALYSIS; ESTIMATION; FREQUENCIES; MIRRORS; OPTICAL INSTRUMENT LENSES; PROJECTION SYSTEMS; WAVEFRONTS;

FLARES; HIGH SPATIAL FREQUENCY ROUGHNESS; LOW SPATIAL FREQUENCY ROUGHNESS; MID SPATIAL FREQUENCY ROUGHNESS; NUMERICAL APERTURE (NA); WAVEFRONT ERRORS (WFE);

LITHOGRAPHY;

EID: 3843113252 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.562365 Document Type: Conference Paper

Times cited : (3)

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