Amorphous refractory compound film material for X-ray mask absorbers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 9 A, 2000, Pages 5329-5333

  Iba, Yoshihisa ^a   Kumasaka, Fumiaki ^a   Iizuka, Takashi ^a   Yamabe, Masaki ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISTORTION (WAVES); ETCHING; MASKS; PATTERN RECOGNITION; REFRACTORY METAL COMPOUNDS; SPUTTERING; TANTALUM ALLOYS; X RAY APPARATUS;

X RAY MASK ABSORBERS;

AMORPHOUS FILMS;

EID: 0034268696     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5329     Document Type: Article

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