Satic microfield printing at the advanced light source with the ETS Set-2 optic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 64-71

  Naulleau, Patrick P ^a   Goldberg, Kenneth A ^a   Anderson, Erik H ^a   Attwood, David ^b   Batson, Phillip ^a   Bokor, Jeffrey ^a,b   Denham, Paul ^a   Gullikson, Eric ^a   Harteneck, Bruce ^a   Hoef, Brian ^a   Jackson, Keith ^a   Olynick, Deirdre ^a   Rekawa, Seno ^a   Salmassi, Farhad ^a   Blaedel, Ken ^c   Chapman, Henry ^c   Hale, Layton ^c   Soufli, Regina ^c   Spiller, Eberhard ^c   Sweeney, Don ^c   Taylor, John ^c   Walton, Chris ^c   Ray Chaudhuri, Avijit ^d   O'Connell, Donna ^d   Stulen, Richard ^d   Tichenor, Daniel ^d   Gwyn, Charles W ^e   Yan, Pei Yang ^e   Zhang, Guojing ^e   more..

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

^e INTEL CORPORATION   (United States)

Author keywords

Decoherentizing illuminator; Extreme ultraviolet lithography; Microfield printing; Synchrotron radiation

Indexed keywords

COHERENT LIGHT; INTERFEROMETERS; INTERFEROMETRY; LIGHTING; PHOTORESISTORS; PRINTING;

PHASE-SHIFTING POINT DIFFRACTION INTERFEROMETERS (PS/PDI);

PHOTOLITHOGRAPHY;

ILLUMINATION; INTERFEROMETRY; LIGHT; PRINTING;

EID: 0003053929     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472318     Document Type: Article

References (16)

1. J. H. Underwood and T. W. Barbee, Jr., "Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance, " Appl. Opt. 20, 3027-3034 (1981).
2. D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, and J. Underwood, "Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography, " Appl. Opt, 32, 7022-7031 (1993).
3. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, "Phase-shifting point diffraction interferometer, " Opt. Lett. 21, 1526-1528 (1996).
4. K. Goldberg, P. Naulleau, J. Bokor, and H. Chapman, "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic, " these proceedings.
5. K.A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry, " Proc. SPIE Vol. 3048, 264-70 (1997).
6. P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, "Extreme-ultraviolet phase-shifting point diffraction interferometer: a wave-front metrology tool with sub-angstrom reference-wave accuracy, " Appl. Opt. 38, 7252-7263 (1999).
7. K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system, " J. Vac. Sci. and Technol. B 18, 2911-15 (2000).
8. D.A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, R. P. Nissen, R. L. Schmitt, G. A. Wilkerson, L. A. Brown, P. A. Spence, P. S. Jin, W. C. Sweat, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, O. R. Wood II, W. K. Waskiewicz, D. L. White, D. L. Windt, and T. E. Jewell, "Development and characterization of a 10× Schwarzschild system for SXPL, " in OSA Proceedings on Soft X-Ray Projection Lithography, Vol. 18, A. M. Hawryluk and R. H. Stulen, eds., (Optical Society of America, Washington, DC, 1993), pp. 79-82.
9. D.W. Sweeney, R. Hudyma, H. N. Chapman, and D. Shafer, "EUV optical design for a 100 nm CD imaging system, " in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 2-10 (1998).
10. D. Tichenor, W. Replogle, S. Lee, W. Ballard, G. Kubiak, L. Klebanoff, J. Goldsmith, J. Wronosky, L. Hale, H. Chapman, J. Taylor, K. Goldberg, P. Naulleau "Performance upgrades in the EUV Engineering Test Stand, " these proceedings.
11. S. Lee, D. Tichenor, W. Replogle, H. Chapman, L. Bernardez, W. Ballard, A. Leung, D. O'Connell, E. Panning, J. Bjorkholm, C. Gwyn, "Lithographic evaluation of the EUV engineering test stand, " these proceedings.
12. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J, Bokor, "At wavelength characterization of the Engineering Test Stand Set-2 optic, " J. Vac. Sci. and Technol. B 19, 2396-2400 (2001).
13. D. Attwood, P. Naulleau, K. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. Gullikson, H. Medecki, and J. Underwood, "Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions, " IEEE J. Quantum Electron. 35, 709-720 (1999).
14. C. Chang, P. Naulleau, E. Anderson, and D. Attwood, "Spatial coherence characterization of undulator radiation, " Opt. Comm. 182, 25-34 (2000).
15. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor, "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer, " Proceedings of the SPIE Vol. 4343, 639-645 (2001).
16. J. W. Goodman, Statistical Optics, John Wiley and Sons, New York, 1986.