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Volumn 4688, Issue 1, 2002, Pages 64-71

Satic microfield printing at the advanced light source with the ETS Set-2 optic

(29)  Naulleau, Patrick P a   Goldberg, Kenneth A a   Anderson, Erik H a   Attwood, David b   Batson, Phillip a   Bokor, Jeffrey a,b   Denham, Paul a   Gullikson, Eric a   Harteneck, Bruce a   Hoef, Brian a   Jackson, Keith a   Olynick, Deirdre a   Rekawa, Seno a   Salmassi, Farhad a   Blaedel, Ken c   Chapman, Henry c   Hale, Layton c   Soufli, Regina c   Spiller, Eberhard c   Sweeney, Don c   more..


Author keywords

Decoherentizing illuminator; Extreme ultraviolet lithography; Microfield printing; Synchrotron radiation

Indexed keywords

COHERENT LIGHT; INTERFEROMETERS; INTERFEROMETRY; LIGHTING; PHOTORESISTORS; PRINTING;

EID: 0003053929     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472318     Document Type: Article
Times cited : (12)

References (16)
  • 1
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    • Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: Theory and predicted performance
    • J. H. Underwood and T. W. Barbee, Jr., "Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance, " Appl. Opt. 20, 3027-3034 (1981).
    • (1981) Appl. Opt. , vol.20 , pp. 3027-3034
    • Underwood, J.H.1    Barbee, T.W.2
  • 3
    • 0030257954 scopus 로고    scopus 로고
    • Phase-shifting point diffraction interferometer
    • H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, "Phase-shifting point diffraction interferometer, " Opt. Lett. 21, 1526-1528 (1996).
    • (1996) Opt. Lett. , vol.21 , pp. 1526-1528
    • Medecki, H.1    Tejnil, E.2    Goldberg, K.A.3    Bokor, J.4
  • 5
    • 0001582350 scopus 로고    scopus 로고
    • Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry
    • K.A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, "Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry, " Proc. SPIE Vol. 3048, 264-70 (1997).
    • (1997) Proc. SPIE , vol.3048 , pp. 264-270
    • Goldberg, K.A.1    Tejnil, E.2    Lee, S.H.3    Medecki, H.4    Attwood, D.T.5    Jackson, K.H.6    Bokor, J.7
  • 6
    • 0000805935 scopus 로고    scopus 로고
    • Extreme-ultraviolet phase-shifting point diffraction interferometer: A wave-front metrology tool with sub-angstrom reference-wave accuracy
    • P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, "Extreme-ultraviolet phase-shifting point diffraction interferometer: a wave-front metrology tool with sub-angstrom reference-wave accuracy, " Appl. Opt. 38, 7252-7263 (1999).
    • (1999) Appl. Opt. , vol.38 , pp. 7252-7263
    • Naulleau, P.1    Goldberg, K.2    Lee, S.3    Chang, C.4    Attwood, D.5    Bokor, J.6
  • 7
    • 0034317823 scopus 로고    scopus 로고
    • Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system
    • K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, "Extreme ultraviolet alignment and testing of a four mirror aspheric extreme ultraviolet optical system, " J. Vac. Sci. and Technol. B 18, 2911-15 (2000).
    • (2000) J. Vac. Sci. and Technol. B , vol.18 , pp. 2911-2915
    • Goldberg, K.A.1    Naulleau, P.2    Batson, P.3    Denham, P.4    Chapman, H.5    Bokor, J.6
  • 9
    • 0032402532 scopus 로고    scopus 로고
    • EUV optical design for a 100 nm CD imaging system
    • Emerging Lithographic Technologies II, Y. Vladimirsky, ed
    • D.W. Sweeney, R. Hudyma, H. N. Chapman, and D. Shafer, "EUV optical design for a 100 nm CD imaging system, " in Emerging Lithographic Technologies II, Y. Vladimirsky, ed., Proc. SPIE 3331, 2-10 (1998).
    • (1998) Proc. SPIE , vol.3331 , pp. 2-10
    • Sweeney, D.W.1    Hudyma, R.2    Chapman, H.N.3    Shafer, D.4
  • 14
    • 0001034734 scopus 로고    scopus 로고
    • Spatial coherence characterization of undulator radiation
    • C. Chang, P. Naulleau, E. Anderson, and D. Attwood, "Spatial coherence characterization of undulator radiation, " Opt. Comm. 182, 25-34 (2000).
    • (2000) Opt. Comm. , vol.182 , pp. 25-34
    • Chang, C.1    Naulleau, P.2    Anderson, E.3    Attwood, D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.