Low-temperature materials and thin film transistors for flexible electronics

Proceedings of the IEEE

Volumn 93, Issue 8, 2005, Pages 1420-1428

  Sazonov, Andrei ^a   Striakhilev, Denis ^a   Lee, Czang H O ^a   Nathan, Arokia ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

Amorphous hydrogenated silicon; Amorphous silicon nitride; Amorphous silicon oxide; Flexible electronics; Nanocrystalline silicon; Plasma enhanced chemical vapor deposition; Thin film transistors

Indexed keywords

ELECTRONIC EQUIPMENT; HYDROGENATION; LIGHT EMITTING DIODES; LOW TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE;

AMORPHOUS HYDROGENATED SILICON AMORPHOUS SILICON NITRIDE; AMORPHOUS SILICON OXIDE; FLEXIBLE ELECTRONICS; NANOCRYSTALLINE SILICON;

THIN FILM TRANSISTORS;

EID: 23644455993     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPROC.2005.851497     Document Type: Review

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