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Volumn 769, Issue , 2003, Pages 165-170

Low Temperature PECVD Silicon Oxide For Devices And Circuits On Flexible Substrates

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CURRENT DENSITY; DIELECTRIC DEVICES; ELECTROMAGNETIC WAVE ABSORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GATES (TRANSISTOR); LEAKAGE CURRENTS; MOLECULAR VIBRATIONS; MOS CAPACITORS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SILICA; THIN FILM TRANSISTORS; THRESHOLD VOLTAGE;

EID: 1542440034     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-769-h6.6     Document Type: Conference Paper
Times cited : (17)

References (14)
  • 4
    • 0033689573 scopus 로고    scopus 로고
    • Flat-Panel Displays and Sensors - Principles, Materials and Processes, edited by B.R. Chalamala, R.H. Friend, T.N. Jackson, and F.R. Libsch, Warrendale, PA
    • G. Lucovsky and J.C. Phillips in Flat-Panel Displays and Sensors - Principles, Materials and Processes, edited by B.R. Chalamala, R.H. Friend, T.N. Jackson, and F.R. Libsch (Mater. Res. Soc. Proc. 558, Warrendale, PA, 2000) pp.135-140
    • (2000) Mater. Res. Soc. Proc. , vol.558 , pp. 135-140
    • Lucovsky, G.1    Phillips, J.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.