Fabrication of a-Si:H TFTs at 120°C on flexible polyimide substrates

Materials Research Society Symposium - Proceedings

Volumn 558, Issue , 2000, Pages 375-380

  Sazonov, Andrei ^a   Nathan, Arokia ^a   Murthy, R V R ^a   Chamberlain, S G ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; LOW TEMPERATURE OPERATIONS; METALLIZING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYIMIDES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; STRESSES; SUBSTRATES; THIN FILM TRANSISTORS;

INTRINSIC MECHANICAL STRESS; LARGE AREA IMAGING APPLICATIONS; WET ETCHANTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033706404     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)