Optimization of 75°C amorphous silicon nitride for TFTs on plastics

Materials Research Society Symposium - Proceedings

Volumn 769, Issue , 2003, Pages 303-308

  McArthur, Christian ^a   Meitine, Mark ^a   Sazonov, Andrei ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; COMPRESSIVE STRESS; DIELECTRIC MATERIALS; ELECTRIC RESISTANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LITHOGRAPHY; OPTIMIZATION; PASSIVATION; SILICON NITRIDE; STOICHIOMETRY; THERMAL EFFECTS; THIN FILM TRANSISTORS;

CHANNEL LAYERS; DEPOSITION TEMPERATURE; METAL-INSULATOR SEMICONDUCTOR (MIS);

PLASTICS;

EID: 1542754885     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-769-h9.8     Document Type: Conference Paper

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