Total-electron-yield X-ray standing-wave measurements of multilayer X-ray mirrors for interface structure evaluation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4250-4252

  Muramatsu, Yasuji ^a   Takenaka, Hisataka ^a   Gullikson, Eric M ^b   Perera, Rupert C C ^c  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRONS; INTERFACES (MATERIALS); LIGHT REFLECTION; MULTILAYERS; PHOTOCURRENTS; SHRINKAGE; STANDING WAVE METERS; X RAY ANALYSIS;

X-RAY MIRRORS;

MIRRORS;

EID: 0036614050     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4250     Document Type: Article

References (11)