-
2
-
-
0000780278
-
On the diffraction of an object-glass with a circular aperture
-
George Biddell Airy, "On the Diffraction of an Object-Glass with a Circular Aperture," Transactions of the Cambridge Philosophical Society, 5, pp. 283-291 (1835).
-
(1835)
Transactions of the Cambridge Philosophical Society
, vol.5
, pp. 283-291
-
-
Airy, G.B.1
-
3
-
-
60049098657
-
Beiträge zur Theorie des Mikroskops und der mikroskopischen Wahrnehmung
-
Ernst Abbe, "Beiträge zur Theorie des Mikroskops und der mikroskopischen Wahrnehmung," Archiv für Mikroskopische Anatomie 9, pp. 413-468 (1873).
-
(1873)
Archiv für Mikroskopische Anatomie
, vol.9
, pp. 413-468
-
-
Abbe, E.1
-
4
-
-
0004546130
-
-
F. Vieweg, Braunschweig, Germany
-
O. Lummer, F. Reiche, Die Lehre von der Bildentstehung im Mikroskop von Ernst Abbe, (F. Vieweg, Braunschweig, Germany, 1910).
-
(1910)
Die Lehre von der Bildentstehung im Mikroskop von Ernst Abbe
-
-
Lummer, O.1
Reiche, F.2
-
5
-
-
0001522710
-
Investigations in optics, with special reference to the spectroscope
-
Lord Rayleigh, "Investigations in optics, with special reference to the spectroscope," Philosophical Magazine 8, pp. 261-274, 403-411, 477-486 (1879);
-
(1879)
Philosophical Magazine
, vol.8
, pp. 261-274
-
-
Rayleigh, L.1
-
6
-
-
3943087234
-
Investigations in optics, with special reference to the spectroscope
-
Lord Rayleigh, "Investigations in optics, with special reference to the spectroscope," Philosophical Magazine 9, pp. 40-55 (1880).
-
(1880)
Philosophical Magazine
, vol.9
, pp. 40-55
-
-
Rayleigh, L.1
-
7
-
-
0001195918
-
On the theory of optical instruments, with special reference to the microscope
-
Lord Rayleigh, "On the theory of optical instruments, with special reference to the microscope," Philosophical Magazine 42, pp. 167-195 (1896).
-
(1896)
Philosophical Magazine
, vol.42
, pp. 167-195
-
-
Rayleigh, L.1
-
11
-
-
84860946732
-
-
"Mask for photolithography," US .S. Patent No. 5,242,770 (filed January 16; issued September 7)
-
Jang F. Chen and James A. Matthews, "Mask for photolithography, " US .S. Patent No. 5,242,770 (filed January 16, 1992; issued September 7, 1993).
-
(1992)
-
-
Chen, J.F.1
Matthews, J.A.2
-
12
-
-
0001222557
-
Mask assisted off-axis illumination technique for random logic
-
J. Garofalo, C. Biddick, R.L. Kostelak, S. Vaidya, "Mask assisted off-axis illumination technique for random logic" J. Vac. Sci. Technol. B 11, pp. 2651-2658 (1993).
-
(1993)
J. Vac. Sci. Technol. B
, vol.11
, pp. 2651-2658
-
-
Garofalo, J.1
Biddick, C.2
Kostelak, R.L.3
Vaidya, S.4
-
13
-
-
51149138953
-
Interference bands and their applications
-
Lord Rayleigh, "Interference bands and their applications," Nature 48, pp. 212-214 (1893);
-
(1893)
Nature
, vol.48
, pp. 212-214
-
-
Rayleigh, L.1
-
14
-
-
51149127265
-
Polish
-
and "Polish", Nature 64, pp. 385-388 (1901).
-
(1901)
Nature
, vol.64
, pp. 385-388
-
-
-
15
-
-
0020249292
-
Improving resolution in photolithography with a phase-shifting mask
-
Marc D. Levenson, N.S. Viswanathan, R.A. Simpson, "Improving resolution in photolithography with a phase-shifting mask," IEEE Trans. Electron Dev. ED-29, pp. 1828-1836 (1982).
-
(1982)
IEEE Trans. Electron Dev.
, vol.ED-29
, pp. 1828-1836
-
-
Levenson, M.D.1
Viswanathan, N.S.2
Simpson, R.A.3
-
16
-
-
2942667960
-
Adoption of phase shift at 64M is unavoidable
-
July
-
[Adoption of phase shift at 64M is unavoidable], [Nikkei Microdevices] 61, pp. 103-114 (July 1990),
-
(1990)
Nikkei Microdevices
, vol.61
, pp. 103-114
-
-
-
18
-
-
0033712150
-
Forbidden Pitches for 130 nm lithography and below
-
R. Socha et al. "Forbidden Pitches for 130 nm lithography and below", in Optical Microlithography XIII, Proc. SPIE 4000 pp. 1140-1155 (2000).
-
(2000)
Optical Microlithography XIII, Proc. SPIE
, vol.4000
, pp. 1140-1155
-
-
Socha, R.1
-
19
-
-
0027857035
-
Resolution improvement using auxiliary pattern groups in oblique illumination lithography
-
Emi Tamechika, Toshiyuki Horiuchi, Katsuhiro Harada, "Resolution improvement using auxiliary pattern groups in oblique illumination lithography," Japan. J. Appl. Phys. 32, Part I, pp. 5856-5862 (1993).
-
(1993)
Japan. J. Appl. Phys.
, vol.32
, Issue.1 PART
, pp. 5856-5862
-
-
Tamechika, E.1
Horiuchi, T.2
Harada, K.3
-
20
-
-
0033310414
-
Integration of optical proximity correction strategies in strong phase shifter design for poly-gate layer
-
C. Spence, M. Plat, E. Sahouria, N. Cobb, and F. Schellenberg, "Integration of Optical proximity Correction Strategies in Strong Phase Shifter Design for Poly-Gate Layer," in 19th Annual Symposium on Photomask Technology, Proc SPIE 3873, pp 277-287 (1999).
-
(1999)
19th Annual Symposium on Photomask Technology, Proc SPIE
, vol.3873
, pp. 277-287
-
-
Spence, C.1
Plat, M.2
Sahouria, E.3
Cobb, N.4
Schellenberg, F.5
-
21
-
-
0025893478
-
Chromeless phase-shifted masks: A new approach to phase-shifting masks
-
Kenny K.H. Toh, Giang Dao, Rajeev Singh, Henry Gaw, "Chromeless phase-shifted masks: a new approach to phase-shifting masks," in 10th Annual Symposium on Microlithography, Proc. SPIE 1496, pp. 27-53 (1990).
-
(1990)
10th Annual Symposium on Microlithography, Proc. SPIE
, vol.1496
, pp. 27-53
-
-
Toh, K.K.H.1
Dao, G.2
Singh, R.3
Gaw, H.4
-
23
-
-
0026157687
-
A novel optical lithography technique using the phase-shifter fringe
-
T. Tanaka, S. Uchino, N. Nasegawa, T. Yamanaka, T. Terasawa, and S. Okazaki, "A novel optical lithography technique using the phase-shifter fringe," Japan. J. Appl. Phys. 30, pp. 1131-1136 (1991).
-
(1991)
Japan. J. Appl. Phys.
, vol.30
, pp. 1131-1136
-
-
Tanaka, T.1
Uchino, S.2
Nasegawa, N.3
Yamanaka, T.4
Terasawa, T.5
Okazaki, S.6
-
24
-
-
0026400576
-
Transparent phase shifting mask with multistage phase shifter and comb-shaped shifter
-
H. Watanabe, Y. Todokoro, Y. Hirai, M. Inoue, "Transparent phase shifting mask with multistage phase shifter and comb-shaped shifter," in Optical/Laser Microlithography IV Proc. SPIE 1463, pp. 101-110 (1991).
-
(1991)
Optical/Laser Microlithography IV Proc. SPIE
, vol.1463
, pp. 101-110
-
-
Watanabe, H.1
Todokoro, Y.2
Hirai, Y.3
Inoue, M.4
-
25
-
-
84860952224
-
-
"Phase shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas," US Patent 5,362,584 (filed Apr. 2, issued Nov. 8)
-
P.J. Brock, J.A. Franklin, F.M. Schellenberg, J. Tsay, "Phase shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas," US Patent 5,362,584 (filed Apr. 2, 1993, issued Nov. 8, 1994).
-
(1993)
-
-
Brock, P.J.1
Franklin, J.A.2
Schellenberg, F.M.3
Tsay, J.4
-
26
-
-
0035758758
-
Binary halftone chromeless PSM technology for λ/4 optical lithography
-
J.F. Chen, J.S. Petersen, R. Socha, T. Laidig, K.E. Wampler, K. Nakagawa, G. Hughes, S. MacDonald, and W. Ng, "Binary halftone chromeless PSM technology for λ/4 optical lithography," in Optical Microlithography XIV, Proc. SPIE 4346, pp. 515-533 (2001).
-
(2001)
Optical Microlithography XIV, Proc. SPIE
, vol.4346
, pp. 515-533
-
-
Chen, J.F.1
Petersen, J.S.2
Socha, R.3
Laidig, T.4
Wampler, K.E.5
Nakagawa, K.6
Hughes, G.7
MacDonald, S.8
Ng, W.9
-
27
-
-
0013457238
-
Complex two dimensional pattern lithography using chromeless phase lithography (CPL)
-
Douglas J. Van Den Broeke, J. Fung Chen, Thomas L. Laidig, Stephen Hsu, Kurt E. Wampler, Robert J. Socha, John S. Petersen, "Complex two dimensional pattern lithography using chromeless phase lithography (CPL)," J. Microlith. Microfab. Microsyst. 1, pp. 229-242, (2002).
-
(2002)
J. Microlith. Microfab. Microsyst.
, vol.1
, pp. 229-242
-
-
Van Den Broeke, D.J.1
Chen, J.F.2
Laidig, T.L.3
Hsu, S.4
Wampler, K.E.5
Socha, R.J.6
Petersen, J.S.7
-
28
-
-
0026259209
-
Improvement of phase shifter line edge method
-
H. Jinbo and Y. Yamashita, "Improvement of phase shifter line edge method" Japan. J Appl. Phys. 30, pp. 2998-3003 (1991).
-
(1991)
Japan. J Appl. Phys.
, vol.30
, pp. 2998-3003
-
-
Jinbo, H.1
Yamashita, Y.2
-
29
-
-
2542434347
-
Complementary double-exposure technique (CODE): A way to print 80- And 65-nm gate levels using a double-exposure binary mask approach
-
S. Manakli, Y. Trouiller, O. Toublan, P. Schiavone, Y. Rody, P.-J. Goirand, "Complementary double-exposure technique (CODE): a way to print 80- and 65-nm gate levels using a double-exposure binary mask approach", J. Microlith. Microfab. Microsyst. 3, pp. 305-315 (2004).
-
(2004)
J. Microlith. Microfab. Microsyst.
, vol.3
, pp. 305-315
-
-
Manakli, S.1
Trouiller, Y.2
Toublan, O.3
Schiavone, P.4
Rody, Y.5
Goirand, P.-J.6
-
30
-
-
0036416660
-
Model-assisted double dipole decomposition
-
A. Torres, F. M. Schellenberg, O. Toublan, "Model-assisted double dipole decomposition", in Optical Microlithography XV, Proc SPIE Vol. 4691 pp. 407-417 (2002).
-
(2002)
Optical Microlithography XV, Proc SPIE
, vol.4691
, pp. 407-417
-
-
Torres, A.1
Schellenberg, F.M.2
Toublan, O.3
-
31
-
-
18644379512
-
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
-
S. Hsu et al., "Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond", in Optical Microlithography XVI, Proc SPIE Vol. 4691 pp. 476-490 (2003).
-
(2003)
Optical Microlithography XVI, Proc SPIE
, vol.4691
, pp. 476-490
-
-
Hsu, S.1
-
33
-
-
2942650406
-
Source Optimization for image fidelity and throughput
-
Y. Granik, "Source Optimization for image fidelity and throughput", J. Microlith. Microfab. Microsyst. 3, pp. 509-522 (2004).
-
(2004)
J. Microlith. Microfab. Microsyst.
, vol.3
, pp. 509-522
-
-
Granik, Y.1
-
34
-
-
71549126234
-
Optimum mask and source patterns for printing a given shape
-
A.E. Rosenbluth, S. Bukofsky, M. Hibbs, K. Lai, R.N. Singh, A.K. Wong, "Optimum mask and source patterns for printing a given shape," J. Microlith. Microfab. Microsyst. 1, pp. 13-30 (2002).
-
(2002)
J. Microlith. Microfab. Microsyst.
, vol.1
, pp. 13-30
-
-
Rosenbluth, A.E.1
Bukofsky, S.2
Hibbs, M.3
Lai, K.4
Singh, R.N.5
Wong, A.K.6
-
35
-
-
3843105673
-
Contact hole reticle optimization by using interference mapping
-
paper 5377-20
-
R. Socha, "Contact hole reticle optimization by using interference mapping," in Optical Microlithography XVII, Proc. SPIE 5377, paper 5377-20 (2004).
-
(2004)
Optical Microlithography XVII, Proc. SPIE
, vol.5377
-
-
Socha, R.1
-
36
-
-
0031655070
-
Illuminator design for printing regular contact patterns
-
M. Burkhardt, A. Yen, C. Progler, and G. Wells, "Illuminator design for printing regular contact patterns," Microelectronic Engineering 41, p. 91 (1998).
-
(1998)
Microelectronic Engineering
, vol.41
, pp. 91
-
-
Burkhardt, M.1
Yen, A.2
Progler, C.3
Wells, G.4
-
37
-
-
0032657147
-
Illuminator optimization for projection printing
-
E. Barouch, S.L. Knodle, S.A. Orszag and M. Yeung, "Illuminator optimization for projection printing, in Optical Microlithography XII, Proc SPIE 3679, pp. 697-703 (1999).
-
(1999)
Optical Microlithography XII, Proc SPIE
, vol.3679
, pp. 697-703
-
-
Barouch, E.1
Knodle, S.L.2
Orszag, S.A.3
Yeung, M.4
-
38
-
-
3843080609
-
Mask-induced polarization
-
A. Estroff, Y. Fan, A. Bourov, F. C. Cropanese, N. V. Lafferty, L. V. Zavyalova, B.W. Smith, "Mask-induced polarization", in Optical Microlithography XVII Proc SPIE 5377, pp. 1069-1080 (2004).
-
(2004)
Optical Microlithography XVII Proc SPIE
, vol.5377
, pp. 1069-1080
-
-
Estroff, A.1
Fan, Y.2
Bourov, A.3
Cropanese, F.C.4
Lafferty, N.V.5
Zavyalova, L.V.6
Smith, B.W.7
-
39
-
-
84860952225
-
-
Refractive Index computations available from B. Smith, http://www.rit.edu/%7E635dept5/thinfilms/thinfilms.htm
-
-
-
Smith, B.1
-
40
-
-
0032510134
-
Extraordinary optical transmission through sub-wavelength hole arrays
-
T. Ebbesen et al., "Extraordinary optical transmission through sub-wavelength hole arrays", Nature 391, pp. 667-669 (1998).
-
(1998)
Nature
, vol.391
, pp. 667-669
-
-
Ebbesen, T.1
-
41
-
-
0000021844
-
Surface plasmons enhance optical transmission through sub-wavelength holes
-
H. F. Ghaemi, T. Thio, D.E. Grupp, T. Ebbesen, and H.J. Lezec, "Surface plasmons enhance optical transmission through sub-wavelength holes" Phys. Rev. B 58 pp 6779-6782 (1998).
-
(1998)
Phys. Rev. B
, vol.58
, pp. 6779-6782
-
-
Ghaemi, H.F.1
Thio, T.2
Grupp, D.E.3
Ebbesen, T.4
Lezec, H.J.5
-
42
-
-
0036378571
-
A nano-aperture with 1000x power throughput enhancement for very small aperture laser systems (VSAL)
-
X. Shi, R. Thornton and L. Hesselink, "A nano-aperture with 1000x power throughput enhancement for very small aperture laser systems (VSAL)" in Optical Data Storage 2001, Proc SPIE Vol. 4342, pp. 320-327 (2002).
-
(2002)
Optical Data Storage 2001, Proc SPIE
, vol.4342
, pp. 320-327
-
-
Shi, X.1
Thornton, R.2
Hesselink, L.3
-
43
-
-
0041766230
-
Ultrahigh light transmission through a C-shaped nanoaperture
-
X. Shi, L. Hesselink, and R. Thornton, "Ultrahigh light transmission through a C-shaped nanoaperture", Opt. Lett. 28, pp. 1320-1322 (2003).
-
(2003)
Opt. Lett.
, vol.28
, pp. 1320-1322
-
-
Shi, X.1
Hesselink, L.2
Thornton, R.3
-
44
-
-
79956044791
-
Light emission from the shadows: Surface plasmon nano-optics at near and far fields
-
S.C. Hohng et al., "Light emission from the shadows: Surface plasmon nano-optics at near and far fields", Appl. Phys. Lett. 81, pp. 3239-3241 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 3239-3241
-
-
Hohng, S.C.1
-
45
-
-
84957315547
-
Extending the lifetime of optical lithography technologies with wavefront engineering
-
Marc D. Levenson, "Extending the lifetime of optical lithography technologies with wavefront engineering," Japan. J. Appl. Phys. 33, pp. 6765-6773 (1994).
-
(1994)
Japan. J. Appl. Phys.
, vol.33
, pp. 6765-6773
-
-
Levenson, M.D.1
-
46
-
-
0038641930
-
Vortex Mask: Making 80nm contacts with a twist!
-
M. Levenson, G. Dai, and T. Ebihara, "Vortex Mask: Making 80nm contacts with a twist!" in 22nd Annual BACUS Symposium on Photomask Technology, Proc. SPIE 4889, p. 1293-1303, (2002)
-
(2002)
22nd Annual BACUS Symposium on Photomask Technology, Proc. SPIE
, vol.4889
, pp. 1293-1303
-
-
Levenson, M.1
Dai, G.2
Ebihara, T.3
-
47
-
-
2942678990
-
There are no fundamental limits to optical lithography
-
Ch 5, A. Guenther, ed., SPIE Press, Bellingham, WA
-
S.R.J. Braeck, "There are no fundamental limits to optical lithography" Ch 5 of International Trends in Applied Optics, A. Guenther, ed., SPIE Press, Bellingham, WA (2002)
-
(2002)
International Trends in Applied Optics
-
-
Braeck, S.R.J.1
-
48
-
-
5444250026
-
Immersion lithography and its impact on semiconductor manufacturing
-
B.J. Lin, "Immersion lithography and its impact on semiconductor manufacturing", J. Microlith. Microfab. Microsyst. 3, pp. 377-500 (2004).
-
(2004)
J. Microlith. Microfab. Microsyst.
, vol.3
, pp. 377-500
-
-
Lin, B.J.1
-
51
-
-
0036381345
-
Impact of EUV light scatter on CD control as a result of mask density changes
-
Ch. Krautschik, M. Ito, I. Nishiyama, S. Okazaki, "Impact of EUV light scatter on CD control as a result of mask density changes", in Emerging Lithographic Technologies VIII; Proc. SPIE 4688, pp 289-301 (2002).
-
(2002)
Emerging Lithographic Technologies VIII; Proc. SPIE
, vol.4688
, pp. 289-301
-
-
Krautschik, Ch.1
Ito, M.2
Nishiyama, I.3
Okazaki, S.4
-
52
-
-
3843051249
-
Anisotropic EUV flare measured in the Engineering Test Stand (ETS)
-
S.H. Lee, M. Chandhok, C. Krautschik, M. Goldstein "Anisotropic EUV Flare Measured in the Engineering Test Stand (ETS)" in Emerging Lithographic Technologies VIII; Proc. SPIE 5374, pp. 818-823 (2004).
-
(2004)
Emerging Lithographic Technologies VIII; Proc. SPIE
, vol.5374
, pp. 818-823
-
-
Lee, S.H.1
Chandhok, M.2
Krautschik, C.3
Goldstein, M.4
-
53
-
-
0141459709
-
Implementing flare compensation for EUV masks through localized mask CD resizing
-
Ch. Krautschik et al. "Implementing flare compensation for EUV masks through localized mask CD resizing", in Emerging Lithographic Technologies VII; Proc. SPIE 5037, pp. 58-68 (2003).
-
(2003)
Emerging Lithographic Technologies VII; Proc. SPIE
, vol.5037
, pp. 58-68
-
-
Krautschik, Ch.1
-
54
-
-
0141501289
-
Design strategies for future lithography technologies (or: OPC will never die)
-
F.M. Schellenberg, "Design strategies for future lithography technologies (or: OPC will never die)", in Emerging Lithographic Technologies VII; Proc. SPIE 5037, pp. 591-598 (2003).
-
(2003)
Emerging Lithographic Technologies VII; Proc. SPIE
, vol.5037
, pp. 591-598
-
-
Schellenberg, F.M.1
-
55
-
-
0003716166
-
-
Princeton University Press, Princeton, NJ
-
J. D. Joannopoulos, R. D. Meade and J. N. Winn, Photonic Crystals (Princeton University Press, Princeton, NJ, 1995).
-
(1995)
Photonic Crystals
-
-
Joannopoulos, J.D.1
Meade, R.D.2
Winn, J.N.3
-
56
-
-
0346392366
-
All optical transistor action with bistable switching in a photonic crystal cross-waveguide geometry
-
M.F. Yanik et al., "All optical transistor action with bistable switching in a photonic crystal cross-waveguide geometry" Optics Letters 28, pp. 2506-2508 (2003).
-
(2003)
Optics Letters
, vol.28
, pp. 2506-2508
-
-
Yanik, M.F.1
-
57
-
-
1842557738
-
Stopping light all optically
-
M.F. Yanik & S. Fan, "Stopping Light All Optically" Physical Review Letters, Vol. 92(8), 083931 (2004)
-
(2004)
Physical Review Letters
, vol.92
, Issue.8
, pp. 083931
-
-
Yanik, M.F.1
Fan, S.2
|