Binary halftone chromeless PSM technology for λ/4 optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 515-533

  Chen, J Fung ^a   Petersen, John S ^b   Socha, Robert ^a   Laidig, Thomas ^a   Wampler, Kurt E ^a   Nakagawa, Kent ^a   Hughes, Greg ^c   MacDonald, Susan ^c   Ng, Waiman ^d  

^a ASML US Inc   (United States)

^b Petersen Advanced Lithography Inc   (United States)

^c DuPont Photomasks Inc   (United States)

^d KLA TENCOR CORPORATION   (United States)

Author keywords

Chromeless PSM; CLM; Halftone; High NA; OAI; Off axis illumination; OPC; Proximity effect; PSM; QUASAR

Indexed keywords

IMAGING TECHNIQUES; MASKS; PHASE SHIFTERS; SCANNING ELECTRON MICROSCOPY;

OFF-AXIS ILLUMINATION (OAI);

PHOTOLITHOGRAPHY;

EID: 0035758758     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435751     Document Type: Article

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