Complex two-dimensional pattern lithography using chromeless phase lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 3, 2002, Pages 229-242

  Van Den Broeke, Douglas ^a   Chen, J Fung ^a   Laidig, Tom ^a   Hsu, Stephen ^a   Wampler, Kurt E ^a   Socha, Robert ^a   Peterson, John S ^b  

^a ASML US Inc   (United States)

^b Petersen Advanced Lithography Inc   (United States)

Author keywords

Chromeless phase lithography; Chromeless PSM; CLM; Model OPC; OAI; Off axis illumination; OPC; OPE; Proximity effects; PSM; QUASAR

Indexed keywords

EID: 0013457238     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1504458     Document Type: Article

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