The vortex mask: Making 80nm contacts with a twist!

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1293-1303

  Levenson, Marc D ^a   Dai, Grace ^b   Ebihara, Takeaki ^c  

^a MD Levenson Consulting   (United States)

^b Sigma C   (United States)

^c NEC Corporation of America   (United States)

Author keywords

Contact; Double Exposure; Optical Vortex; PSM; Via

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELDS; IMAGE QUALITY; IMAGING SYSTEMS; PHASE SHIFT; QUARTZ; REFRACTIVE INDEX; TRANSMISSION ELECTRON MICROSCOPY;

OPTICAL VORTEX;

MASKS;

EID: 0038641930     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467406     Document Type: Conference Paper

References (20)

1. I. Pollentier, P. Jaenen, C. Baerts & C. Ronse, "Sub-50nm gate patterning using line-trimming with 248nm or 193nm litho," Microlithography World, 11.2, 4-8, 25 (2002)
2. P.M. Schellenberg, V. Boksha, N. Cobb, J.C. Lai, C.H. Chen & Chris Mack, "Impact of mask errors on full chip error budgets," Proc. SPIE 3679, 261-275 (1999).
3. J.F. Chen, T. Laidig, K.E. Wampler, R. Caldwell, K.H. Nakagawa & A. Liechen, "A practical technology path to sub-0.10 micron process generations via enhanced optical lithography," Proc. SPIE 3873, 995-1016 (1999).
4. H. Jinbo & Y. Yamashita, IEEE IEDM-90 Tech. Dig., 90-825 (1990).
5. A. Grassmann, C. Friedrich, Uwe Griesinger, R. Pforr & D. Widmann, "Contact hole production by means of crossing sudden phase shift edges of a single phase mask, International Patent WO 01/22164 A1 (2001).
6. J. F. Nye & M. V. Berry, "Dislocations in wave trains," Proc. R. Soc. London Sect. A 336, 165-190 (1974).
7. G. Molina-Terriza, J. Recolons & L. Torner, "The curious arithmetic of optical vortices," Opt. Lett., 25, 1135-1137 (2001)
8. S.C. Tan, M.D. Levenson & G. Dai (to be published.)
9. F. M. Schellenberg, M.D. Levenson & P. J. Brock, "Optimization of real phase mask performance," Proc. SPIE 1604, 274-296 (1991).
10. C. A. Mack, "Using the normalized image log-slope, part 6: development path, Microlithography World, 112, 20-22 (2002).
11. M. Fritze, D. K. Astolfi, D.W. Yost, P.W. Wyatt and H. Liu, "Chromeless phase-shift masks used for sub-100nm SOI CMOS transistors," Solid State Technol. 43.7, 116-131 (July, 2001)
12. B. W. Smith, L. Zavyalova, "Customizing optical illumination," Microlithography World, 8.4, 4-10 (Nov. 1999).
13. A. Erdmann, R. Gordon, M. McCallum & A. Rosenbusch, "3D electromagnetic field simulation for low k1 lithography," Microlithography World, 10.1, 5-10 (Feb. 2001).
14. M.D. Levenson & T. Ebihara, "Exposing the DUV SCAAM - 70nm imaging on the cheap!" SPIE Proc. 4692-40 (2002).
15. C. Grant Willson, Private Communication (1991)
16. M. Fritze, B. Tyrrell, D. Astofi, D. Yost, P. David, B. Wheeler, R. Mallen, J. Jarmolowicz & S. Cann, "100-nm Node Lithography With KrF?," Proc. SPIE 4346, 191-204 (2001).
17. M. I. Sanchez, W. D. Hinsberg, F. A. Houle, J. A. Hoffhagle, H. Ito & C. Nguyen, "Effect of aerial image contrast on resist line-edge roughness," Microlithography World, 8.3, 19-21 (1999).
18. M. Toriumi, S. Ishikawa, S. Miyoshi, T. Naito, T. Yamazaki, M. Watanabe & T. Itani, "Resist materials for 157nm lithography," Proc. SPIE 4345, 371-378 (2001).
19. Y. Yokoyama, T. Hattori, K. Kimura, T. Tanaka & H. Shiraishi, "ArF negative resists system using androsterone structure with δ-hydroxy acid for 100nm phase-shifting lithography, Proc. SPIE 4345, 58-66 (2001)
20. F. Coopmans, B. Roland, "DESIRE: A novel dry-developed resist system," Proc. SPIE 631, 34 (1986)