Forbidden pitches for 130 nm lithography and below

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Socha, Robert ^a   Dusa, Mircea ^a   Capodieci, Luigi ^a   Finders, Jo ^a   Chen, Fung ^a   Flagello, Donis ^a   Cummings, Kevin ^a  

^a ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHTING; MASKS;

BINARY MASKS (BIM); FORBIDDEN PITCHES; PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0033712150     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)