Anisotropic EUV flare measured in the Engineering Test Stand (ETS)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 818-823

  Lee, Sang Hun ^a   Chandhok, Manish ^a   Krautschik, Chris ^a   Goldstein, Michael ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Directional flare; Engineering Test Stand; Extreme ultraviolet lithography; Flare; H V flare bias; Kirk method

Indexed keywords

DIRECTIONAL FLARE; ENGINEERING TEST STAND (ETS); EXTREME ULTRAVIOLET LITHOGRAPHY; H-V FLARE BIAS;

ANISOTROPY; ERROR COMPENSATION; LIGHT SCATTERING; MIRRORS; NATURAL FREQUENCIES; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 3843051249     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537311     Document Type: Conference Paper

References (14)

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