Polarization effects in immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 329-343

  Adam, Konstantinos ^a   Maurer, Wilhelm ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Hopkins imaging; Immersion lithography; Polarization; SOCS approximation; Vector diffraction theory

Indexed keywords

HOPKINS IMAGING; IMMERSION LITHOGRAPHY; SOCS APPROXIMATION; VECTOR DIFFRACTION THEORY;

COMPUTER SIMULATION; DIFFRACTION; ELECTRIC FIELDS; IMAGE PROCESSING; LITHOGRAPHY; MATHEMATICAL MODELS; REFRACTIVE INDEX; VECTORS;

POLARIZATION;

EID: 2942676843     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534322     Document Type: Conference Paper

References (13)

1. K. Adam, Y. Granik, A. Torres, N. Cobb, "Improved Modeling Performance with an Adapted Vectorial Formulation of the Hopkins Imaging Equations", Proceedings of the SPIE, vol. 5040, 2003
2. D. G. Flagello, T. Milster, A. E. Rosenbluth, "Theory of High-NA Imaging in Homogeneous Thin Films", J. Opt. Soc. Am. A, vol. 13(1), pp. 53-64, January 1996.
3. M. S. Yeung, D. Lee, R. Lee, A. R. Neureuther, "Extension of the Hopkins Theory of Partially Coherent Imaging to Include Thin-Film Interference Effects", Proceedings of the SPIE, vol. 1927, pp. 452-463, 1993.
4. E. Wolf, "Electromagnetic Diffraction in Optical Systems I. An Integral Representation of the Image Field", Proc. Roy. Soc. A253, pp. 349-357, 1959.
5. B. Richards, E. Wolf, "Electromagnetic Diffraction in Optical Systems II. Structure of the Image Field in an Aplanatic System", Proc. Roy. Soc. A253, pp. 358-379, 1959.
6. M. Mansuripur, "Distribution of Light at and near the Focus of High Numerical Aperture Objectives", J. Opt. Soc. Am. A, vol. 3, pp. 2086-2093, 1986.
7. H. H. Hopkins, "On the Diffraction Theory of Optical Images", Proc. Roy. Soc. A217, pp. 408-432, 1953.
8. N. Cobb, A. Zakhor, E. Miloslavsky, "Mathematical and CAD Framework for Proximity Correction", Proceedings of the SPIE, vol. 2726, pp. 208-222, 1996.
9. A. K. K. Wong, Resolution Enhancement Techniques in Optical Lithography, SPIE Press, vol. TT47, p. 63
10. B. Streefkerk, et al., "Extending Optical Lithography with Immersion", Proceedings of the SPIE, vol. 5377, 2004
11. D. C. Cole, E. Barouch, U. Hollerbach, S. A. Orszag, "Extending Scalar Aerial Image Calculations to Higher Numerical Apertures", J. Vac. Sci. Technol. B, vol. 10(6), pp. 3037-3041, Nov/Dec 1992
12. H. Ling, S. Lee, "Focusing of Electromagnetic Waves through a Dielectric Interface", J. Opt. Soc. Am. A, vol. 1(9), pp. 965-973, 1984.
13. R. Socha, Propagation Effects of Partially Coherent Light in Optical Lithography and Inspection, Electronics Research Laboratory, University of California, Berkeley, chapter 8, 1997.