Model assisted double dipole decomposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 407-417

  Torres, J A ^a   Schellenberg, F ^a   Toublan, O ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Dipole Illumination; Double Exposure; Low k1 imaging; Microlithography; Model Based OPC

Indexed keywords

IMAGING TECHNIQUES; MASKS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; PHASE SHIFT;

DIPOLE ILLUMINATION;

PHOTOLITHOGRAPHY;

EID: 0036416660     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474589     Document Type: Conference Paper

References (7)

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