Three-dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 7, 2005, Pages 1437-1441

  Liu, Z Q ^a   Mitsuishi, K ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ION BEAM ASSISTED DEPOSITION; MIM DEVICES; NANOSTRUCTURED MATERIALS; PHOTONS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON-BEAM-INDUCED DEPOSITION (EBID); HIGH-ENERGY ELECTRONS; NANOTWEEZERS; SCANNING TRANSMISSION ELECTRON MICROSCOPES (STEM);

NANOTECHNOLOGY;

EID: 18544385940     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2999-x     Document Type: Article

References (27)

1. K. Liu, P. Avouris, J. Bucchisnano, R. Martel, S. Sun, J. Michl: Appl. Phys. Lett. 80, 865 (2002)
2. A.J. Storm, J.H. Chen, X.S. Ling, H.W. Zandbergen, C. Dekker: Nat. Mater. 2, 537 (2003)
3. M. Castagné, M. Benfedda, S. Lahimer, P. Falgayrettes, J.P. Filiard: Ultramicroscopy 76, 187 (1999)
4. K.I. Schiffmann: Nanotechnology 4, 163 (1993)
5. F. Zenhausern, M. Adrian, B. ten Heggeler-Bordier, F. Ardizzoni, P. Descouts: J. Appl. Phys. 73, 7232 (1993)
6. L. Done, F. Arai, T. Fukuda: Appl. Phys. Lett. 81, 1919 (2002)
7. M. Weber, M. Rudolph, J. Kretz, H.W.P. Koops: J. Vac. Sci. Technol. B 13, 461 (1995)
8. H.W.P. Koops, C. Schössler, A. Kaya, M. Weber: J. Vac. Sci. Technol. B 14, 4105 (1996)
9. F. Floreani, H.W. Koops, W. Elsäßer: Nucl. Instrum. Methods B 483, 488 (2002)
10. C. Schoessler, H.W.P. Koops: J. Vac. Sci. Technol. B 16, 862 (1998)
11. H.W.P. Koops, J. Kretz, M. Rudolph, M. Weber: J. Vac. Sci. Technol. B 11, 2386 (1993)
12. N. Miura, H. Ishii, J. Shirakashi, A. Yamada, M. Konagai: Appl. Surf. Sci. 113-114, 269 (1997)
13. M. Komuro, H. Hiroshima: Microelectron. Eng. 35, 273 (1997)
14. H.W.P. Koops, E. Dohisz, J. Urban: J. Vac. Sci. Technol. B 15, 1369 (1997)
15. Y.M. Lau, P.C. Chee, J.T.L. Thong, V. Ng: J. Vac. Sci. Technol. A 20, 1295 (2002)
16. S. Kawata, H.B. Sun, T. Tanaka, K. Takada: Nature 412, 697 (2001)
17. S. Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda, Y. Haruyama: J. Vac. Sci. Technol. B 18, 3181 (2000)
18. K. Mitsuishi, M. Shimojo, M. Han, K. Furuya: Appl. Phys. Lett. 83. 2064 (2003)
19. M. Tanaka, M. Shimojo, K. Mitsuishi, K. Furuya: Appl. Phys. A 78, 543 (2004)
20. L. Reimer, W. Wächter: Ultramicroscopy 3. 169 (1978)
21. T.E. Allen, R.R. Kunz, T.M. Mayer: J. Vac. Sci. Technol. B 6, 2057 (1988)
22. N. Silvis-Cividjian, C.W. Hagen, P. Kruit, M.A.J. v.d. Stam, H.B. Groen: Appl. Phys. Lett. 82, 3514 (2003)
23. Z.Q. Liu, K. Mitsuishi, K. Furuya: Nanotechnology 15, 414 (2004)
24. Z.Q. Liu, K. Mitsuishi, K. Furuya: J. Appl. Phys. 96, 619 (2004)
25. P. Bøgaild, T.M. Hansen, C. Tanasa, F. Grey: Nanotechnolosy 12, 331 (2001)
26. Z.Q. Liu, K. Mitsuishi, K. Furuya: J. Appl. Phys. 96(7) (2004), in press
27. N.A. Kislov, U. Khodos: Microsc. Microanal. Microstruct. 3, 323 (1992)