Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography

Applied Physics Letters

Volumn 80, Issue 5, 2002, Pages 865-867

  Liu, K ^a   Avouris, Ph ^a   Bucchignano, J ^a   Martel, R ^a   Sun, S ^a   Michl, J ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CO PARTICLES; ELECTRODE GAP; FABRICATION YIELD; LEAKAGE RESISTANCE; SIMPLE METHOD;

ELECTRIC PROPERTIES;

FABRICATION;

EID: 79956016490     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1436275     Document Type: Article

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