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Volumn 18, Issue 18, 2004, Pages 987-1001

The optical properties of nitrogenated amorphous carbon films grown by a novel surface wave microwave plasma CVD method

Author keywords

a C:N; Annealing; Camphor; Microwave plasma; Optical gap; Surface wave plasma

Indexed keywords

CARBON; NITROGEN; SILICON DIOXIDE;

EID: 12544259689     PISSN: 02179849     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0217984904007529     Document Type: Article
Times cited : (10)

References (62)
  • 33
    • 0021558454 scopus 로고
    • Part B, ed. J. I. Pankove Academic Press, Orlando
    • G. D. Cody, in Semiconductors and Semimetals, Vol. 21, Part B, ed. J. I. Pankove (Academic Press, Orlando, 1984), p. 11.
    • (1984) Semiconductors and Semimetals , vol.21 , pp. 11
    • Cody, G.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.