Surface and bulk properties of electron beam evaporated carbon films

Thin Solid Films

Volumn 293, Issue 1-2, 1997, Pages 96-102

  Besold, J ^a   Thielsch, R ^a   Matz, N ^a   Frenzel, C ^a   Born, R ^b   Mobius A ^a  

^a IFW DRESDEN   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Amorphous materials; Carbon; Evaporation; Surface and interface states

Indexed keywords

ELECTRIC VARIABLES MEASUREMENT; ELECTRON BEAMS; ENERGY GAP; EVAPORATION; GLASS; GRAPHITE; INTERFACES (MATERIALS); LIGHT ABSORPTION; OXIDATION; RAMAN SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SUBSTRATES;

ELECTRON BEAM EVAPORATION; SCANNING TUNNELING MICROSCOPY; SURFACE TOPOGRAPHY;

AMORPHOUS FILMS;

EID: 0030676926     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09000-1     Document Type: Article

References (25)

1. N. Savvides, Mater. Sci. Forum, 52&53 (1990) 407.
2. L. Maynards, V. Venkatesan, J.A. von Windheim and D.G. Thomson, Thin Solid Films, 238 (1994) 37.
3. J. Robertson, Adv. Phys., 35 (1986) 317.
4. J. Robertson and E.P. O'Reilly, Phys. Rev., B35 (1987) 2946.
5. G.J. Vandentop, P.A.P. Nascente, M. Kawasaki, C.F. Ogletree, G.A. Somorjai and M. Salmeron, J. Vac. Sci. Technol, A9 (1991) 2273.
6. L. Vazquez, J.A. Martin-Gago, F. Comin and S. Ferrer, Ultramicroscopy, 42-44 (1992) 616.
7. J.J. Hauser, J. Non-Crystall. Solids, 23 (1977) 21.
8. D. Dasgupta, F. Demichelis and A. Tagliaferro, Philos. Mag., B63 (1991) 1255.
9. B.I. Shklowski and A.L. Efros, Electronic Properties of Doped Semiconductors, Springer Verlag, Berlin, 1984.
10. J. Besold, G. Reiss and H. Hoffmann, Appl. Surf. Sci., 65/66 (1993) 23.
11. J. Besold, R. Kunze and N. Matz, J. Vac. Sci. Technol., B12 (1994) 1764.
12. J. Taue, R. Grigorovici and A. Vancu, Phys. Status Solidi, 15 (1966) 627.
13. J. Tauc and A. Menth, J. Non-Crystall. Solids, 8-10 (1972) 569.
14. J. Besold and N. Matz, Surf. Coat. Technol., 67 (1994) 161.
15. J. Tersoff and D. Hamann, Phys. Rev., B31 (1985) 805.
16. P. Lespade, R. Al-Jishi and M.S. Dresselhaus, Carbon, 20 (1982) 427.
17. J.P. Pelz and R.H. Koch, Phys. Rev., B41 (1990) 1212.
18. F. Tuinistra and J.L. Koenig, J. Chem. Phys., 53 (1970) 1126.
19. M. Yoshikawa, G. Katagiri, H. Ishida, A. Ishitani and T. Akamatsu, Appl. Phys. Lett., 52 (1988) 1639.
20. N. Wada, P.J. Gaczi and S.A. Solin, J. Non-Crystall. Solids, 35 (1980) 543.
21. M. Morgan, Thin Solid Films, 7 (1971) 313.
22. W. Schoepe, K. Uhlig and K. Neumaier, Cryogenics, 29 (1989) 467.
23. N.F. Mott, Philos, Mag., 19 (1969) 835.
24. A.L. Efros and B.I. Shklovski, J. Phys. C: Solid State Phys., 8 (1975) L49.
25. C.J. Adkins, J. Phys.: Cond. Matter, 1 (1989) 1253.