Influence of deposition parameters on the structural, optical and electrical properties of amorphous carbon and amorphous carbon nitride films grown by pulsed laser deposition using camphoric carbon target

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 388, Issue PART 3, 2002, Pages

  Rusop, M ^a   Tian, X M ^a   Soga, T ^a   Jimbo, T ^a   Umeno, M ^b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b CHUBU UNIVERSITY   (Japan)

Author keywords

Amorphous carbon; Amorphous carbon nitride; Deposition parameter; Laser fluence; Pulsed laser deposition; Target to substrate distance

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; CARBON NITRIDE; EXCIMER LASERS; FILM GROWTH; PULSED LASER DEPOSITION; SURFACE PROPERTIES;

AMORPHOUS CARBON; AMORPHOUS CARON NITRIDE; DEPOSITION PARAMETER; LASER FLUENCE; TARGET TO SUBSTRATE DISTANCE;

CARBON;

EID: 11144228015     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587250290113934     Document Type: Conference Paper

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