Characteristics of hydrogenated amorphous carbon films deposited by large-area microwave-sustained surface wave plasma

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 976-979

  Nagatsu, M ^a   Sano, T ^b   Takada, N ^b   Toyoda, N ^c   Tanga, M ^d   Sugai, H ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c Nissin Inc   (Japan)

^d Toyo Kohan Co   (Japan)

Author keywords

Amorphous carbon; Chemical vapor deposition; Diamond like carbon; Field emission

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC FIELD EFFECTS; FIELD EMISSION CATHODES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH (MATERIALS); HYDROGENATION; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; WAVE PLASMA INTERACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLANAR SURFACE;

CARBON;

FILM;

EID: 0036508139     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00616-1     Document Type: Article

References (14)