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Volumn 9, Issue 3, 2000, Pages 777-780
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Semiconducting hydrogenated carbon-nitrogen alloys with low defect densities
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
BINDING ENERGY;
DEFECTS;
ENERGY GAP;
HYDROGENATION;
NITROGEN COMPOUNDS;
PARAMAGNETISM;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTING FILMS;
ULTRAVIOLET SPECTROSCOPY;
HYDROGENATED AMORPHOUS CARBON FILMS;
LOW DEFECT DENSITIES;
AMORPHOUS FILMS;
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EID: 12944267050
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(99)00324-6 Document Type: Article |
Times cited : (3)
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References (18)
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