Reactive magnetron sputtering of CNx thin films at different substrate bias

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 223-227

  Zheng, W T ^a,b   Broitman, E ^a   Hellgren, N ^a   Xing, K Z ^a   Ivanov, I ^a   Sjostrom H ^a   Hultman, L ^a   Sundgren, J E ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b JILIN UNIVERSITY   (China)

Author keywords

CNx films; Magnetron sputtering

Indexed keywords

CHEMICAL BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NEGATIVE SUBSTRATE BIAS;

AMORPHOUS FILMS;

EID: 0031245673     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00407-0     Document Type: Article

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